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Welcome to the cryomagnetic lab
More than just a cryo lab!
The cryomagnetic lab has been named like that due to SDUs newest addition, the cryostat. The cryostat allows quantum experiments and measurments under extermenly stable environmental conditions. More specifically the tool serves as a powerful platform for characterizing the electronic or magnetoelectronic properties of materials or micro/nanostructures through ultralow-noise measurements leading thus to new applications in quantum electronics such as quantum computing.
But that is not the only technology this lab has to offer. It has one powerful tool for characterization of samples and another impressive tool for analysis and reverse engineering.
The Bruker x-ray nanotomograph from CIE (Center for Industrial Electronics) is a tool that allows the characterization of samples and devices in depth. It does that by scanning the sample with x-rays and reconstructing the actual sample in a 3D model, giving users the ability to inspect the inner parts of samples and devices without destroying or altering the sample.
The Zeiss Comet 3D scanner opens the doors to reverse engineering, analytical sample inspection and analysis. With such tool, users are able to scan objects and obtain a 3D model of the object that they can use to reconstruct the part, inspect the fabricated object to the original design model and much more.
___
C:MAC vr tour
WELCOME TO THE VIRTUAL TOUR OF THE CENTER for materials anlanysis and characterization of SDU
Dear guest,
We would like to welcome you to this virtual tour of the center for materials analysis and characterization. This interactive tour starts at the main entrance of the cleanroom laboratory where you can chose to enter the cleanroom facilities or proceed to the helium ion microscope lab or the cryomagnetic lab.
If you enter the cleanroom facilities the tour proceeds through the various rooms a user must go through. Inside the facilities you will be able to see how the facilities look like from a first-person perspective and read some general information about the equipment located inside.
At each point, a floor map to the bottom right of the screen shows you where you are in the facility. Apart from the navigation arrows on the floor, you can click on the map and navigate through the different areas.
Enjoy!
Cleanroom facts:
- Class 100 / ISO 5 classification. An ISO 5 cleanroom is designed to allow no more than 3520 particles equal to or larger than 0.5 micrometer per cubic meter of air.
- Total of 235 square meter usable area.
- Temperature is stable at 21 degree celcius with 1 degree celcius temperature control.
- The relative humidity is 40% year-around with 3% relative humidity control.
- max. 4" wafer processing.
___
Entrance
area for users to pick up their cleanroom suit
Entrance to the cleanroom is only allowed when wearing a special suit and shoes. In this area users can find cleanroom suits and shoes, cleanroom special wipes and other cleanroom consumables. The suits are specially prepared for a cleanroom environment and they are sealed in bags. Different cleanroom classifications have different rules on the gowning.
Once a user picks up his cleanroom suit and shoes, he/she needs to remove his/her own shoes and wear special feet covers to limit contamination inside the gowning area. To further limit the contamination inside, every cleanroom has a set of rules that the users have to follow. These rules exist because the experiments conducted inside the cleanroom are critical and sensitive to the smallest particle.
some General cleanroom rules:
- Wear proper cleanroom gowning, gloves and safety goggles.
- Do not wear make-up inside the cleanroom.
- Remove any jewelry and personal items from pockets.
- Do not eat or use chewing gum in the cleanroom.
- Limit your motion and excessive talking. A motionless person generates 100.000 particles per minute, walking generates around 5.000.000 particles per minute.
- If you are ill or have a cough, do not enter the cleanroom.
___
WHITE AREA
Location of characterization equipment.
The white area of the cleanroom has mainly all the necessary equipment for characterization of samples and devices fabricated inside the facility. Here, users can inspect their sample to check the micro- and nanofeatures, the morphology, the roughness of the surface and other features that may be of interest in research. In addition some equipment used for sample fabrication and preparation is also located here, based on the needs of each facility and the device fabrication processes.
Characterization of a sample is a crucial step in research as it forms the basis for understanding the composition of a device, the reliability of the fabrication process, the quality of the materials used and much more. By characterizing their samples researchers can optimize their fabrication process and achieve their results better and in a more efficient manner.
Equipment available:
- Scanning Electron Microscope (SEM)
- Optical Microscope
- Atomic Force Microscope (AFM)
- Profilometer
- Optical Interferometer
- Physical Vapor Deposition (PVD) system
- Sputter Coater
- Ellipsometer
- Capillary Force Assisted Assembly System
- Wafer Cleaning Wet Benches
- R2R Prototype Imprinting
___
YELLOW AREA
AREA FOR FABRICATION AND CHEMICAL PROCESSING.
The yellow light in this area is necessary for photolithography process, to avoid unwanted exposure of photoresist to light of shorter wavelengths (< 500 nm). Photolithography is a fundamental process in device fabrication. Most of the components in any electronic device we have nowadays are produced in rooms like this.
The fabrication starts by using a UV sensitive photoresist. This resist can be patterned using UV light and a machine called mask aligner. The fabrication of a device, for example a transistor, involves multiple steps of photoresist patterning, wet or dry etching, metal deposition and more, and those processes often are repeated multiple times in a process known as bottom-up process. Because of UV sensitivity of the resist and the vast amount of fabrication steps, the ambient light must be such that it does not alter the properties of the resist, hence the yellow light.
___
gowning area
THe gowning area is where users dress up in their cleanroom suits.
After entering the gowning area, users can remove the protective packaging from their suits from the protective packaging and wear them. The package holding the suit and the boots can be opened in this area only, as this is part of the cleanroom environment, and the suits will not get contaminated by the "dirty" ambient.
The gowning occurs in steps. First, the user puts on the cleanroom suit in the white area of the room, making sure the suit doesn't touch the floor. Once the suit is on the user sits on the bench and puts on the boots and can then step on the blue area. The blue mat is a sticky mat which holds any last particles that may fall from the user during the gowning process. After that the user puts on gloves and can enter the cleanroom area.
___
Entrance
area for users to pick up their cleanroom suit
Entrance to the cleanroom is only allowed when wearing a special suit and shoes. In this area users can find cleanroom suits and shoes, cleanroom special wipes and other cleanroom consumables. The suits are specially prepared for a cleanroom environment and they are sealed in bags. Different cleanroom classifications have different rules on the gowning.
Once a user picks up his cleanroom suit and shoes, he/she needs to remove his/her own shoes and wear special feet covers to limit contamination inside the gowning area. To further limit the contamination inside, every cleanroom has a set of rules that the users have to follow. These rules exist because the experiments conducted inside the cleanroom are critical and sensitive to the smallest particle.
some General cleanroom rules:
- Wear proper cleanroom gowning, gloves and safety goggles.
- Do not wear make-up inside the cleanroom.
- Remove any jewelry and personal items from pockets.
- Do not eat or use chewing gum in the cleanroom.
- Limit your motion and excessive talking. A motionless person generates 100.000 particles per minute, walking generates around 5.000.000 particles per minute.
- If you are ill or have a cough, do not enter the cleanroom.
___
gowning area
THe gowning area is where users dress up in their cleanroom suits.
After entering the gowning area, users can remove the protective packaging from their suits from the protective packaging and wear them. The package holding the suit and the boots can be opened in this area only, as this is part of the cleanroom environment, and the suits will not get contaminated by the "dirty" ambient.
The gowning occurs in steps. First, the user puts on the cleanroom suit in the white area of the room, making sure the suit doesn't touch the floor. Once the suit is on the user sits on the bench and puts on the boots and can then step on the blue area. The blue mat is a sticky mat which holds any last particles that may fall from the user during the gowning process. After that the user puts on gloves and can enter the cleanroom area.
___
YELLOW AREA
AREA FOR FABRICATION AND CHEMICAL PROCESSING.
The yellow light in this area is necessary for photolithography process, to avoid unwanted exposure of photoresist to light of shorter wavelengths (< 500 nm). Photolithography is a fundamental process in device fabrication. Most of the components in any electronic device we have nowadays are produced in rooms like this.
The fabrication starts by using a UV sensitive photoresist. This resist can be patterned using UV light and a machine called mask aligner. The fabrication of a device, for example a transistor, involves multiple steps of photoresist patterning, wet or dry etching, metal deposition and more, and those processes often are repeated multiple times in a process known as bottom-up process. Because of UV sensitivity of the resist and the vast amount of fabrication steps, the ambient light must be such that it does not alter the properties of the resist, hence the yellow light.
___
WHITE AREA
Location of characterization equipment.
The white area of the cleanroom has mainly all the necessary equipment for characterization of samples and devices fabricated inside the facility. Here, users can inspect their sample to check the micro- and nanofeatures, the morphology, the roughness of the surface and other features that may be of interest in research. In addition some equipment used for sample fabrication and preparation is also located here, based on the needs of each facility and the device fabrication processes.
Characterization of a sample is a crucial step in research as it forms the basis for understanding the composition of a device, the reliability of the fabrication process, the quality of the materials used and much more. By characterizing their samples researchers can optimize their fabrication process and achieve their results better and in a more efficient manner.
Equipment available:
- Scanning Electron Microscope (SEM)
- Optical Microscope
- Atomic Force Microscope (AFM)
- Profilometer
- Optical Interferometer
- Physical Vapor Deposition (PVD) system
- Sputter Coater
- Ellipsometer
- Capillary Force Assisted Assembly System
- Wafer Cleaning Wet Benches
- R2R Prototype Imprinting
___
C:MAC vr tour
WELCOME TO THE VIRTUAL TOUR OF THE CENTER for materials anaLysis and characterization of SDU
Dear guest,
We would like to welcome you to this virtual tour of the center for materials analysis and characterization. This interactive tour starts at the main entrance of the cleanroom laboratory where you can chose to enter the cleanroom facilities or proceed to the helium ion microscope lab or the cryomagnetic lab.
If you enter the cleanroom facilities the tour proceeds through the various rooms a user must go through. Inside the facilities you will be able to see how the facilities look like from a first-person perspective and read some general information about the equipment located inside.
At each point, a floor map to the bottom right of the screen shows you where you are in the facility. Apart from the navigation arrows on the floor, you can click on the map and navigate through the different areas.
Enjoy!
Cleanroom facts:
- Class 100 / ISO 5 classification. An ISO 5 cleanroom is designed to allow no more than 3520 particles equal to or larger than 0.5 micrometer per cubic meter of air.
- Total of 235 square meter usable area.
- Temperature is stable at 21 degree celcius with 1 degree celcius temperature control.
- The relative humidity is 40% year-around with 3% relative humidity control.
- max. 4" wafer processing.
___
ZEiss orion nanofab him
helium ion microscope room.
The Zeiss ORION NanoFab Helium Ion Microscope is a new advanced instrument for ultra-high resolution imaging and nanofabrication. Its operation is similar to that of a scanning electron microscope (SEM) but in contrast to SEM, the Orion microscope exploits focused ion beams (FIB),instead of an electron beam, for both image generation and nanostructuring.
The imaging system of the Orion microscope offers high material contrast, large focus depth, and surface sensitivity significantly superior to conventional scanning electron microscopy. The spatial resolution is in sub-nanometer range which is close to the resolution of transmission electron microscopes.
As a material structuring tool, the Orion NanoFab is amongst a few systems in the world, which cover both micro machining to nano machining applications!
Combined in one system, advanced imaging and structuring tools offer unique opportunities for material science and nanofabrication.
___
Entrance
area for users to pick up their cleanroom suit
Entrance to the cleanroom is only allowed when wearing a special suit and shoes. In this area users can find cleanroom suits and shoes, cleanroom special wipes and other cleanroom consumables. The suits are specially prepared for a cleanroom environment and they are sealed in bags. Different cleanroom classifications have different rules on the gowning.
Once a user picks up his cleanroom suit and shoes, he/she needs to remove his/her own shoes and wear special feet covers to limit contamination inside the gowning area. To further limit the contamination inside, every cleanroom has a set of rules that the users have to follow. These rules exist because the experiments conducted inside the cleanroom are critical and sensitive to the smallest particle.
some General cleanroom rules:
- Wear proper cleanroom gowning, gloves and safety goggles.
- Do not wear make-up inside the cleanroom.
- Remove any jewelry and personal items from pockets.
- Do not eat or use chewing gum in the cleanroom.
- Limit your motion and excessive talking. A motionless person generates 100.000 particles per minute, walking generates around 5.000.000 particles per minute.
- If you are ill or have a cough, do not enter the cleanroom.
___
Welcome to the Helium ION microsope
sample preperation area.
___
ZEiss orion nanofab him
helium ion microscope room.
The Zeiss ORION NanoFab Helium Ion Microscope is a new advanced instrument for ultra-high resolution imaging and nanofabrication. Its operation is similar to that of a scanning electron microscope (SEM) but in contrast to SEM, the Orion microscope exploits focused ion beams (FIB),instead of an electron beam, for both image generation and nanostructuring.
The imaging system of the Orion microscope offers high material contrast, large focus depth, and surface sensitivity significantly superior to conventional scanning electron microscopy. The spatial resolution is in sub-nanometer range which is close to the resolution of transmission electron microscopes.
As a material structuring tool, the Orion NanoFab is amongst a few systems in the world, which cover both micro machining to nano machining applications!
Combined in one system, advanced imaging and structuring tools offer unique opportunities for material science and nanofabrication.
___
Welcome to the cryomagnetic lab
More than just a cryo lab!
The cryomagnetic lab has been named like that due to SDUs newest addition, the cryostat. The cryostat allows quantum experiments and measurments under extermenly stable environmental conditions. More specifically the tool serves as a powerful platform for characterizing the electronic or magnetoelectronic properties of materials or micro/nanostructures through ultralow-noise measurements leading thus to new applications in quantum electronics such as quantum computing.
But that is not the only technology this lab has to offer. It has one powerful tool for characterization of samples and another impressive tool for analysis and reverse engineering.
The Bruker x-ray nanotomograph from CIE (Center for Industrial Electronics) is a tool that allows the characterization of samples and devices in depth. It does that by scanning the sample with x-rays and reconstructing the actual sample in a 3D model, giving users the ability to inspect the inner parts of samples and devices without destroying or altering the sample.
The Zeiss Comet 3D scanner opens the doors to reverse engineering, analytical sample inspection and analysis. With such tool, users are able to scan objects and obtain a 3D model of the object that they can use to reconstruct the part, inspect the fabricated object to the original design model and much more.
Solvent wet benches are used in micro- and nanofabrication processes as a final step in patterning structures on a sensitive resist.
HMDS (Hexamethyldisilazane) ovens are used to deposit HMDS on surfaces such as silicon wafers to promote adhesion for the deposition of resists. It is the starting point of the fabrication process of devices such as transistors.
Solvent wet benches are used in micro- and nanofabrication processes as a final step in patterning structures on a sensitive resist.
Refrigerators in cleanrooms are used to store chemicals and solutions in a safe manner. In addition, as many chemicals are temperature sensitive, it prevents them from diminishing.
Acid wet benches are used for etching processes during micro- and nanofabrication. Harsh chemicals such as hydrofluoric acid are used to etch away unwanted or no longer needed materials from wafers and samples.
Spin dryers are devices used to dry wafers that have undergone chemical processing. A spin dryer works by spraying deionized water, heating the chamber, and rotating the wafer at high speeds.
HMDS (Hexamethyldisilazane) ovens are used to deposit HMDS on surfaces such as silicon wafers to promote adhesion for the deposition of resists. It is the starting point of the fabrication process of devices such as transistors.
Refrigerators in cleanrooms are used to store chemicals and solutions in a safe manner. In addition, as many chemicals are temperature sensitive, it prevents them from diminishing.
Acid wet benches are used for etching processes during micro- and nanofabrication. Harsh chemicals such as hydrofluoric acid are used to etch away unwanted or no longer needed materials from wafers and samples.
Spin dryers are devices used to dry wafers that have undergone chemical processing. A spin dryer works by spraying deionized water, heating the chamber, and rotating the wafer at high speeds.
A fume hood is a type of local ventilation that limits exposure to hazardous or toxic fumes, vapours or dust. Some sample processes that cannot be done using the wet benches are conducted under the fume hood using smaller amounts of chemicals and glass beakers.
Plasma ashers use regulated oxygen flow to generate oxygen plasma to remove organic compounds, such as photoresist, from a surface. In addition, polymer activation can be done to seal channels on a Lab-on-Chip (LOC) or to bond together pieces of a silicon based organic polymer such as PDMS (Polydimethylsiloxane).
A scanning electron microscope (SEM) is a type of microscope that uses a beam of electrons to scan a sample's surface. The scan is done rapidly in a raster fashion using a high-energy beam of electrons that is focused on the sample with the help of magnets. The electrons in the beam interact with the atoms on the sample and produce signals that contain information about the sample's surface topography, composition and other properties, such as electrical conductivity.
The result is a high analysis image of the sample with ultra-high resolution down to a nanometer. It is a fast method that allows the user to see and obtain images of a sample from micrometers to nanometers, something that would be impossible with a conventional optical microscope.
In addition, using the same beam of electrons it is possible to write patterns on samples covered with a special resist. Electron beam lithography, allows researchers to fabricate patterns in the nanoscale.
An optical microscope, also known as light microscope, is a tool used for fast inspection and characterization of a sample and a surface. It uses one lens or a series of lenses to magnify images of small samples so that they can be examined in detail. A camera installed on the microscope allows users to take images of their samples to compare them in different steps of a fabrication process.
Emergency shower heads are available inside the cleanroom facility for critical safety situations. In case an emergency occurs, such as a chemical spill, the emergency shower is used to wash away the chemicals from the worker's clothing and skin.
Spin coaters are used for depositing materials onto substrates with accurate and controllable film thickness. During rotation of the sample, the fluid spins off the edges of the substrate until the desired thickness of the film is achieved. Such materials are usually UV sensitive resists used in photolithography for the fabrication of structures.
To enter the cleanroom, users need to wear special suits and boots. They can be stored on this rack. Users first put on the suit and mind that the suit does not touch the floor. Then users sit on the bench and put on the shoes. Once users have the shoes on, they are allowed to step on the blue mat and proceed on putting on gloves.
When users have finished with the gowning process, they can proceed inside the cleanroom facility.
In photolithography processes, a liquid UV sensitive resist is used. Hot plates are used in photolithography processes to solidify the spin-coated resist, but they can be also used for annealing samples.
This is a capillary force assisted particle assembly system, CAPA for short. It is a system that traps nanoparticles when subjected to appropriate conditions, to arrange them on a predefined template.
Generally speaking, the technique involves placing a small droplet of nanoparticles on a structured template. The structured template with the small droplet is brought in close proximity to a stationary glass slide which confines the droplet. When certain conditions are met, movement of the sample towards x direction causes the solution to spread and the particles are forced in the cavities of the structured surface. This results in a patterned surface of nanoparticles. Researchers can use such patterned surfaces for novel photonic applications or as a size selective filters for particle detection.
The Helium Ion Microscope (HIM) is a state-of-the-art tool when it comes to imaging and nanostructuring.
When it comes to imaging the HIM uses a helium beam to interact with the specimen. As the sample gets bombarded with helium ions it releases secondary electrons that are collected by a detector, the signal detected leads to a high-quality image. A helium ion beam has much higher mass and shorter wavelengths than the electron beam, therefore helium ions interact much more strongly with materials than electrons do. Because of this stronger interaction we get more secondary electrons and hence better quality images of the specimen than with a scanning electron microscope.
In addition, the ZEISS ORION Nanofab is a 3-in-1 multibeam ion microscope. This is very important when it comes to nanostructuring and imaging as it gives the possibility to seamlessly switch between gallium, neon and helium beam.
The neon beam can be used to machine nanostructures at great speed and achieve high throughput.
The helium beam can be used to create sub-10 nm structures.
The Gallium focused ion beam can be used to remove massive material from the surface.
As with many of the sample inspection instruments, to image a sample with the HIM users need to prepare their samples. This peparation takes place in this room. In contrast to SEM, samples form HIM do not need any special conductive coating to be inspected.
Users bring their samples and use the dedicated sample holders to mount their samples for imaging. Frequently many sample can be mounted on one stage on many samples be prepared and loaded simultaneously in the HIM. The stage consists typically with a carbon pad adhesive that holds the sample in place during transport and loading in the HIM. The user also has the possibility to inspect their sample under the microscope and make any necessary adjustments.
Once the sample is mounted on the stage the user then takes the stage and proceeds to the next room where the HIM is located to start the process.
A cryostat is a device used to maintain low cryogenic temperatures of samples or devices mounted within the cryostat.
To do this helium is circulated through the system to achieve extremely low temperatures. Helium is used at it has lower boiling point than nitrogen. The temperatures that the experiments take place in this cryostat range from 0.3 K to 300 K (room temperature), that is from -272.8 degrees Celsius to 22 degrees Celsius!
Apart from the low temperature, this system offers high vacuum conditions, isolation against vibrations, isolation against any electrical or magnetic fluctuations. This is of high importance when talk for example about quantum computers. A qubit or quantum bit (basic unit of information in quantum computers) is extremely sensitive to any unwanted excitation. A high vacuum, ultra-stable mechanical and thermal sample environment is required to prevent any unwanted excitation of the qubit state.
Hence such cryostats provide ultra-stable environments for conducting critical experiments.
The ZEISS COMET is a 3D scanner offering great flexibility, high measuring speed and amazing performance. Such scanner find application in quality control and inspection, tool and model making, design, rapid manufacturing, reverse engineering, documentation of object and many more.
The object to be scanned is placed on the rotating table and multiple 3D scans are performed under varying angles. The user then gets a complete and detailed 3D model on the computer to perform the detailed analysis, measure dimensions or simply obtain a 3D model to reconstruct/reproduce the object.
This tool is an x-ray tomograph from the SDU Center for Industrial Electronics (CIE).
The x-ray tomograph is an analytical tool that opens possibilities for 3D imaging and exact modeling of various materials, part, components, devices and much more of different dimensions and complexity. This instrument allows scanning and 3D reconstruction of the internal microstructure of objects ranging from few millimeters up to 300 mm.
Similarly to medical tomography it scans an object and creates 3D model of it allowing the user to view the object in cross sections providing valuable information of the internal and external structure without destroying the object. The tremendous advantage of this tool is that this technique is non-destructive allowing us to obtain 3D views of objects which otherwise could be obtained only by dissecting multiple times the object.
This tool find application is various fields, some examples are:
- Battery research: Allowing researchers to view the internal structure of a battery and assist in fault finding.
- Composite materials: Allowing researchers to investigate the various layers a structure may have and how those layers combine with each other.
- Geology: Assisting in the analysis of different minerals and investigate their structure and volume.
- Additive manufacturing: Analysis of parts and fault finding, for example identification of cracks in iron cast frames.
- Life science: Organ structural analysis without needing to dissect the organ or the specimen.
- Electronics: Component analysis and fault finding to investigate if a batch of components.
To take advantage of the X-Ray tomograph please contact the CIE responsible: Vadzim Adashkevich at vadzim@sdu.dk
For conducting experiments and measurements with the cryostat samples need to be loaded inside the cryochamber. As the samples are usually in the order of 5-10 mm and the structures/features on them in the order of micrometer, a microscope is used to prepare the sample and mount it on a platform.
Once the sample is mounted on the special platform the user then attaches the platform to a specially designed rod. The rod then is lifted with a small crane and inserted in the cryochamber to perform the experiments.
Ellipsometers are instruments used to investigate the dielectric properties of thin films. Values such as refractive index and dielectric function of materials can be easily determined. This is done by measuring the changes of polarization upon reflection or transmission of light from a sample and comparing it to a model. Ellipsometry has found many applications in semiconductor physics, microelectronics, and biology as it provides unequalled capabilities for thin film technology.
Ellipsometers are instruments used to investigate the dielectric properties of thin films. Values such as refractive index and dielectric function of materials can be easily determined. This is done by measuring the changes of polarization upon reflection or transmission of light from a sample and comparing it to a model. Ellipsometry has found many applications in semiconductor physics, microelectronics, and biology as it provides unequalled capabilities for thin film technology.
Physical vapour deposition (PVD) systems are used to coat surfaces and samples with a thin layer of material such as gold, titanium, silicon dioxide, etc. The film thickness can vary from few nanometers to several micrometers. PVD systems are frequently used in micro- and nanofabrication processes of devices and research. All the components in electronic devices nowadays have a thin layer of material deposited, usually using a machine like this.
A user places the sample in the loading chamber and then pumps the system down to achieve high vacuum. Once high vacuum is achieved, a beam of electrons hits the material to be deposited to its evaporation temperature, or a plasma is generated on the target material and causes sputtering of the material. The material atoms then travel through the vacuum and deposit on the surface creating a layer. The more time passes, the thicker the layer becomes.
Sputter coaters are small PVD systems typically used to rapidly coat a non-conducting surface with a thin metal film for SEM imaging. This is done because non-conducting samples can cause the so called "charging effect", leading to distortion of the image. Coating a sample with a thin layer of metal helps to avoid this effect.
For such cases is preferable to use this machine instead of the large PVD system as the chamber volume is smaller, leading to a lower pumping time. The samples are usually coated with a 5-10 nm conducting layer within a few minutes.
The Helium Ion Microscope (HIM) is a state-of-the-art tool when it comes to imaging and nanostructuring.
When it comes to imaging the HIM uses a helium beam to interact with the specimen. As the sample gets bombarded with helium ions it releases secondary electrons that are collected by a detector, the signal detected leads to a high-quality image. A helium ion beam has much higher mass and shorter wavelengths than the electron beam, therefore helium ions interact much more strongly with materials than electrons do. Because of this stronger interaction we get more secondary electrons and hence better quality images of the specimen than with a scanning electron microscope.
In addition, the ZEISS ORION Nanofab is a 3-in-1 multibeam ion microscope. This is very important when it comes to nanostructuring and imaging as it gives the possibility to seamlessly switch between gallium, neon and helium beam.
The neon beam can be used to machine nanostructures at great speed and achieve high throughput.
The helium beam can be used to create sub-10 nm structures.
The Gallium focused ion beam can be used to remove massive material from the surface.
As with many of the sample inspection instruments, to image a sample with the HIM users need to prepare their samples. This peparation takes place in this room. In contrast to SEM, samples form HIM do not need any special conductive coating to be inspected.
Users bring their samples and use the dedicated sample holders to mount their samples for imaging. Frequently many sample can be mounted on one stage on many samples be prepared and loaded simultaneously in the HIM. The stage consists typically with a carbon pad adhesive that holds the sample in place during transport and loading in the HIM. The user also has the possibility to inspect their sample under the microscope and make any necessary adjustments.
Once the sample is mounted on the stage the user then takes the stage and proceeds to the next room where the HIM is located to start the process.
This is a tabletop unit for lab-scale nanoimprint lithography. Nanoimprint lithography is the technique of fabricating structures by imprinting them using a soft or hard template on a UV or heat curable resist.
The user first covers a surface with a resist and then places the surface to be imprinted in the machine. Then the user loads a flexible template, carrying the structures to be imprinted, on a rotating drum. As the process starts, the sample passes below the rotating drum and the structures on the flexible template are imprinted onto the sample. Now the user can use the sample for further processing and device fabrication.
To enter the cleanroom, users need to wear special suits and boots. They can be stored on this rack. Users first put on the suit and mind that the suit does not touch the floor. Then users sit on the bench and put on the shoes. Once users have the shoes on, they are allowed to step on the blue mat and proceed on putting on gloves.
When users have finished with the gowning process, they can proceed inside the cleanroom facility.
Optical profilometers are microscopes that are used to measure height variations, step height and surface roughness on a sample. This is done by measuring the difference in the path between two beams of light that have been split.
Users place a sample under the microscope and light from a lamp is shone on the sample. This light is split in two paths, one goes to the sample and one to a reference mirror. As the light path reflect the sample and the mirror, they recombine and are projected onto a detector. When the path difference between the recombined beams is at the order of a few wavelengths of light or less interference can occur. This interference contains information about the surface contours of the test surface. Obtaining few contours reconstructs a 3D image of the surface and provides, valuable information about the topography of the sample.
Emergency shower heads are available inside the cleanroom facility for critical safety situations. In case an emergency occurs, such as a chemical spill, the emergency shower is used to wash away the chemicals from the worker's clothing and skin.
A profilometer is a measuring instrument used to measure the profile of a surface. It uses a sharp diamond tip that scans laterally over the surface of the sample and is typically used to measure small vertical features ranging in height from 10 nm to 1 mm.
First, the users select the area that they want to scan and they define the contact force. When the scan starts, the sharp tip is dragged across the line path and the software recreates the path on the screen of what the tip senses. The result is a cross section view of the surface that the tip has scanned. From this users can then determine, for example, the height of the structures they have on their sample.
Sputter coaters are small PVD systems typically used to rapidly coat a non-conducting surface with a thin metal film for SEM imaging. This is done because non-conducting samples can cause the so called "charging effect", leading to distortion of the image. Coating a sample with a thin layer of metal helps to avoid this effect.
For such cases is preferable to use this machine instead of the large PVD system as the chamber volume is smaller, leading to a lower pumping time. The samples are usually coated with a 5-10 nm conducting layer within a few minutes.
Physical vapour deposition (PVD) systems are used to coat surfaces and samples with a thin layer of material such as gold, titanium, silicon dioxide, etc. The film thickness can vary from few nanometers to several micrometers. PVD systems are frequently used in micro- and nanofabrication processes of devices and research. All the components in electronic devices nowadays have a thin layer of material deposited, usually using a machine like this.
A user places the sample in the loading chamber and then pumps the system down to achieve high vacuum. Once high vacuum is achieved, a beam of electrons hits the material to be deposited to its evaporation temperature, or a plasma is generated on the target material and causes sputtering of the material. The material atoms then travel through the vacuum and deposit on the surface creating a layer. The more time passes, the thicker the layer becomes.
An RCA bath is a chemical bath used for cleaning organic and inorganic residuals from surfaces such as a silicon wafer. Surfaces need to be cleaned before a device is built as contaminants may cause failure of the device.
An optical microscope, also known as light microscope, is a tool used for fast inspection and characterization of a sample and a surface. It uses one lens or a series of lenses to magnify images of small samples so that they can be examined in detail. A camera installed on the microscope allows users to take images of their samples to compare them in different steps of a fabrication process.
An emergency eyewash is essential equipment for every laboratory that uses chemicals and hazardous substances. The emergency eyewash serves the purpose of reducing workplace injury. In the unlikely case that something gets into a user's eye, they can immediately wash their eyes and this limits the spread of damage in the eye.
Refrigerators in cleanrooms are used to store chemicals and solutions in a safe manner. In addition, as many chemicals are temperature sensitive, it prevents them from diminishing.
A scanning electron microscope (SEM) is a type of microscope that uses a beam of electrons to scan a sample's surface. The scan is done rapidly in a raster fashion using a high-energy beam of electrons that is focused on the sample with the help of magnets. The electrons in the beam interact with the atoms on the sample and produce signals that contain information about the sample's surface topography, composition and other properties, such as electrical conductivity.
The result is a high analysis image of the sample with ultra-high resolution down to a nanometer. It is a fast method that allows the user to see and obtain images of a sample from micrometers to nanometers, something that would be impossible with a conventional optical microscope.
In addition, using the same beam of electrons it is possible to write patterns on samples covered with a special resist. Electron beam lithography, allows researchers to fabricate patterns in the nanoscale.
Spin dryers are devices used to dry wafers that have undergone chemical processing. A spin dryer works by spraying deionized water, heating the chamber, and rotating the wafer at high speeds.
HMDS (Hexamethyldisilazane) ovens are used to deposit HMDS on surfaces such as silicon wafers to promote adhesion for the deposition of resists. It is the starting point of the fabrication process of devices such as transistors.
In photolithography processes, a liquid UV sensitive resist is used. Hot plates are used in photolithography processes to solidify the spin-coated resist, but they can be also used for annealing samples.
Acid wet benches are used for etching processes during micro- and nanofabrication. Harsh chemicals such as hydrofluoric acid are used to etch away unwanted or no longer needed materials from wafers and samples.
Solvent wet benches are used in micro- and nanofabrication processes as a final step in patterning structures on a sensitive resist.
Spin dryers are devices used to dry wafers that have undergone chemical processing. A spin dryer works by spraying deionized water, heating the chamber, and rotating the wafer at high speeds.
Dry etching in nano- and micro fabrication refers to the removal of material by exposure of the material to a plasma of reactive gases such as sulphur hexafluoride, chlorine, oxygen etc. Plasma is generated by applying a 13.56 MHz RF electromagnetic field and introducing gases in the vacuum chamber. The charged ions attack the surface with high velocity removing material from the sample, leading to an anisotropic etching of unmasked areas.
This technique is used as an alternative to wet chemical etching, as the structure's etching profile changes to a large extent. Everything depends on the desired result, and gives more degrees of freedom for patterning structures.
A fume hood is a type of local ventilation that limits exposure to hazardous or toxic fumes, vapours or dust. Some sample processes that cannot be done using the wet benches are conducted under the fume hood using smaller amounts of chemicals and glass beakers.
Plasma ashers use regulated oxygen flow to generate oxygen plasma to remove organic compounds, such as photoresist, from a surface. In addition, polymer activation can be done to seal channels on a Lab-on-Chip (LOC) or to bond together pieces of a silicon based organic polymer such as PDMS (Polydimethylsiloxane).
A mask aligner is an instrument enabling photolithography to selectively remove parts of a thin film to create a pattern or a design onto a substrate. To generate this pattern, the substrate is first coated with a UV sensitive resist. The substrate is then introduced into the mask aligner and a mask carrying the desired pattern is placed above the substrate. A high intensity UV light is shone over the mask. The light only passes through the openings in the pattern and is blocked in the dark areas, making parts of the resist soluble in a developer.
The result is the pattern to be replicated on the resist. Finally, the substrate is taken to the solvent bench and only the areas that are soluble are removed, leaving the pattern behind.
Mask aligners are widely used to generate integrated electronic circuits, specialty photonics materials and microfluidic channels.
Spin coaters are used for depositing materials onto substrates with accurate and controllable film thickness. During rotation of the sample, the fluid spins off the edges of the substrate until the desired thickness of the film is achieved. Such materials are usually UV sensitive resists used in photolithography for the fabrication of structures.
To enter the cleanroom, users need to wear special suits and boots. They can be stored on this rack. Users first put on the suit and mind that the suit does not touch the floor. Then users sit on the bench and put on the shoes. Once users have the shoes on, they are allowed to step on the blue mat and proceed on putting on gloves.
When users have finished with the gowning process, they can proceed inside the cleanroom facility.
Optical profilometers are microscopes that are used to measure height variations, step height and surface roughness on a sample. This is done by measuring the difference in the path between two beams of light that have been split.
Users place a sample under the microscope and light from a lamp is shine on the sample. This light is split in two paths, one goes to the sample and one to a reference mirror. As light reflects the sample and the mirror they recombine and are projected onto a detector. When the path difference between the recombined beams is on the order of a few wavelengths of light or less interference can occur. This interference contains information about the surface contours of the test surface. Obtaining few contour reconstructs a 3D image of the surface, providing valuable information about the topography of the sample.
A profilometer is a measuring instrument used to measure the profile of a surface. It uses a sharp diamond tip that scans laterally over the surface of the sample. Typically used to measure small vertical features ranging in height from 10 nm to 1 mm.
First the users select the area that they want to scan and they define the contact force. When the scan starts, the sharp tip is dragged across the line path and the software recreates the path on the screen of what the tip senses. The result is a cross section view of the surface that the tip has scanned. From this the users can then determine for example the height of the structures they have on their sample.
Atomic force microscopy (AFM) is a surface characterization technique that probes the surface of a sample with a sharp tip, a couple of microns long and often less than 10 nm in diameter. It is a versatile tool that can give 2D and 3D images of a surface down to atomic scale.
The tip is located at the free end of a cantilever, and forces between the tip and the sample surface cause the cantilever to bend or deflect. A detector measures the cantilever deflection as the tip is scanned over the surface of the sample. The measured deflections allow a computer to generate a map of the surface topography, providing the user with information of the surface morphology and other valuable information. It is even possible to see how the atoms are arranged on the surface.
Atomic force microscopy (AFM) is a surface characterization technique that probes the surface of a sample with a sharp tip, a couple of microns long and often less than 10 nm in diameter. It is a versatile tool that can give 2D and 3D images of a surface down to atomic scale.
The tip is located at the free end of a cantilever, and forces between the tip and the sample surface cause the cantilever to bend or deflect. A detector measures the cantilever deflection as the tip is scanned over the surface of the sample. The measured deflections allow a computer to generate a map of the surface topography, providing the user with information of the surface morphology and other valuable information. It is even possible to see how the atoms are arranged on the surface.
This is a capillary force assisted particle assembly system, CAPA for short. It is a system that traps nanoparticles when subjected to appropriate conditions, to arrange them on a predefined template.
Generally speaking, the technique involves placing a small droplet of nanoparticles on a structured template. The structured template with the small droplet is brought in close proximity to a stationary glass slide which confines the droplet. When certain conditions are met, movement of the sample towards x direction causes the solution to spread and the particles are forced in the cavities of the structured surface. This results in a patterned surface of nanoparticles. Researchers can use such patterned surfaces for novel photonic applications or as a size selective filters for particle detection.